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WH-XQY-01 Spray developing cleaning machine -
WH-XQY-01 Spray developing cleaning machine
WH-XQY-01 desktop automatic spray developing equipment can carry out program-controlled automatic development and cleaning of substrates of 7 inches and below, the maximum speed is 400RPM, the maximum liquid volume is 500ml......
1. Product introduction
The developing and cleaning all-in-one machine (WH-XQY-01) is a product independently developed by Wenhao Co., Ltd. with independent intellectual property rights. It is designed and developed for the development and cleaning process in the photolithography process, and can be programmed and automated to develop and clean. . This equipment can completely replace the manual development and cleaning steps in the production process of microfluidic chips, and overcome the uncontrollable amount of developer added in the manual development process, uncontrollable silicon wafer development time, and uncontrollable development effect between silicon wafers of the same specification, etc. Disadvantages, to minimize the development quality problems caused by the operator's human factors and the damage of the silicon wafer.
2. Technical parameters
Speed: 0～400 rpm
Developer volume control: 10～500 mL
Cleaning time control: 0～900 s
Adapted silicon wafer/chip: ≤7 inches
Development time control: 1～900 s
Liquid feeding speed: 0～100%
Power input: AC220V±10V/50HZ
Power: 100W
Weight: 20 kg
Dimensions: 410 (W) * 410 (D) * 350 (H) mm
Working environment: temperature 0℃-40 ℃, relative humidity <80%
